Centre researchers were instrumental in establishing extensive clean-room facilities at UNSW, which have combined with the NSW Node of the Australian National Fabrication Facility (ANFF-NSW) to provide an open-access facility offering advanced nanofabrication capability across four distinct laboratory areas. ANFF-NSW infrastructure and operations are managed by the ANFF-NSW team of 18 staff, headed by Prof Andrew Dzurak (ANFF-NSW Node Director).

CQC2T researchers were instrumental in establishing open access cleanroom facilities at UNSW, which have combined with the NSW Node of the Australian National Fabrication Facility (ANFF-NSW) to provide an extensive facility offering advanced nanofabrication capability across four
distinct laboratory areas.

In 2019, the ANFF-NSW labs were extensively refurbished via a $4.8M UNSW funded project. The project included space restructuring to
accommodate $4.5M of new process tools under the Research Infrastructure Investment Plan (RIIP) supported by co-funding from the Federal Government (NCRIS), State Government (RAAP), and UNSW. Several new tools such as oxidation furnaces, ion etching tools, and electron beam
lithography tools have been delivered and installed utlising this funding.

The ANFF-NSW Lower East Advanced Lithography laboratories comprise 50m2 of ISO5 and 30m2 of ISO7 cleanroom space. The focus in this area is nano-electronic device production, with key equipment. Other tools in this area support wet chemical processing, photolithography, metal deposition, metrology, and wafer dicing.

The ISO6 zone contains e-beam evaporators, a multi-target sputtering system, plasma etching tools, two deep reactive ion etching systems, and a suite of in-process metrology, including a newly installed digital microscopy system.

The ANFF-NSW Upper East laboratories offer a further 50m2 of ISO5 and 90m2 of ISO7 cleanroom space. The ANFF-NSW South laboratories, covering 160m2, were opened mid-2014 and house a Veeco molecular beam epitaxy (MBE) system for the growth of a range of III-V materials and a Pascal dual chamber laser-MBE system producing a range of complex ceramic materials. The new Metrology and Packaging laboratory houses wire-bonders, probe stations, wafer scribers, pick-and-place
tools and a parylene encapsulation tool.

A 60m2 ISO5 cleanroom was created within the South laboratories during the 2019 lab restructuring. This area contains high-temperature furnaces to support core Si MOS processes, specifically diffusion (p-type and n-type), oxidation (both thick and extremely high-quality thin layers), and annealing. In addition, the ISO5 zone has supporting capabilities for wet chemical processing. The ISO7 zone contains a suite of chemical vapour deposition (CVD) tools including plasma-enhance PECVD and newly commissioned low-pressure LPCVD for depositing thin films of Si, SiOx, SiNx and related materials.

The ANFF-NSW West Advanced Lithography, PVD and Plasma-Etching laboratories comprise 80m2 of ISO5 and 110m2 of ISO6 cleanroom space. The ISO5 zone contains four fume cupboards for wet chemical processing as well as photolithography, a newly installed atomic layer deposition, annealing and metrology tools. A dedicated room within the ISO5 zone houses a Raith 150TWO electron lithography system capable of stitch-free high-resolution patterning over large device areas.