Ion Beam Facilities

Nanometre-Depth Ion Implanter

The Melbourne Node is home to a unique low energy (0.01-15keV) ion implanter, located in clean room. The singleion- implantation technology for deterministic ion implantation has been established within the facility.It predominantly uses phosphorus ions for placing single donors in sub-20 nm depth into silicon quantum devices, and also implants nitrogen ions into a shallow depth in diamond samples for NV centre’s creation. It was originally commissioned in 2001 and is equipped with a: G2 ion gun, beam imaging system, computer controlled ion selection, beam on demand and single ion detection capabilities. In 2010-2011, the system was enhanced by the addition of a nanometer positioning stage (AttoCube) to support the step-and-repeat strategy of creating deterministically doped P donor arrays.

MeV Ion Beam Facilities

The Melbourne Node is home to the NEC 5U Pelletron, which operates in the Pelletron Laboratory, located in the basement of the Nuclear Building (Fig. 4). Originally commissioned in 1975, it is a high brightness source of light ions operating at charging potentials up to 5MV. It is routinely used to perform ion beam analysis (IBA), ion beam modification of materials, high energy ion beam lithography and high-energy ion implantation. The IBA applications with and without micro-beam options include Rutherford Backscattering (RBS), Proton Induced X-ray emission (PIXE), Ion Beam Induced Charge (IBIC) and Channelling Contrast Microscopy (CCM) measurements on a variety of materials. During 2011, the Pelletron laboratory was upgraded with new vacuum hardware replacing a large number of older pumps with new, oil-free units. This was made possible with a major grant from the Education Investment Fund (EIF) of the Australian Federal Government.

Crossed beam SEM/FIB, which was designed and built in an international collaboration between JEOL (Japan) and Orsay Physics (France), is centrally located in the Cleanroom Complex.